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Patents
| Result Number | Material Type | Add to My Shelf Action | Record Details and Options |
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| 1 |
Material Type: Patent
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A method for selective etching of nanostructuresNanoLund: Centre for Nanoscience, 2019Digital Resources/Online E-Resources |
| 2 |
Material Type: Patent
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| 3 |
Material Type: Patent
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Reflectorinrichting voor xuv-straling met een pulsduur in het attoseconde-tijdsdomeinDigital Resources/Online E-Resources |
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