Second-stage exposure of implant by a 940-nm pulsating diode laser

The Author(s), under exclusive licence to Springer Nature Switzerland AG 2024. corrected publication 2024. Springer Nature or its licensor (e.g. a society or other partner) holds exclusive rights to this article under a publishing agreement with the author(s) or other rightsholder(s); author self-archiving of the accepted manuscript version of this article is solely governed by the terms of such publishing agreement and applicable law. ;The Author(s), under exclusive licence to Springer Nature Switzerland AG 2024. Springer Nature or its licensor (e.g. a society or other partner) holds exclusive rights to this article under a publishing agreement with the author(s) or other rightsholder(s); author self-archiving of the accepted manuscript version of this article is solely governed by the terms of such publishing agreement and applicable law. ;ISSN: 2367-2587 ;EISSN: 2367-2587 ;DOI: 10.1007/s41547-023-00209-x

Digital Resources/Online E-Resources